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Showing results 1 to 14 of 14

A controlled growth of WNx, and WCx thin films prepared by atomic layer deposition File

Kim, Jun Beom , Jang, Byeonghyeon , Lee, Hyun-Jung , Han, Won Seok , Lee, Do-Joong , Lee, Han-Bo-Ram , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2016-04 View1

Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu File

Han, Seung-Min , Nandi, Dip K. , Joo, Yong-Hwan , Shigetomi, Toshiyuki , Suzuki, Kazuharu , Nabeya, Shunichi , Harada, Ryosuke , Kim, Soo-Hyun

Article Issue Date2020-05 View3

Atomic layer deposition of low-resistivity and high-density tungsten nitride thin films using B2H6, WF6, and NH3 File

Kim, Soo-Hyun , Kim, JK , Kwak, N , Sohn, H , Kim, J , Jung, SH , Hong, MR , Lee, SH , Collins, J

Article Issue Date2006-01 View11

Atomic layer deposition of tungsten and tungsten-based compounds using WCl5 and various reactants selected by density functional theory File

Lee, Minyoung , Hidayat, Romel , Nandi, Dip K. , Kim, Tae Hyun , Kim, Yewon , Kim, Seongyoon , Lee, Won -Jun , Kim, Soo-Hyun

Article Issue Date2021-10 View5

Atomistic kinetic Monte Carlo simulation on atomic layer deposition of TiN thin film File

Kim, Sangtae , An, Hyungmin , Oh, Sangmin , Jung, Jisu , Kim, Byungjo , Nam, Sang Ki , Han, Seungwu

Article Issue Date2022-10 View8

Characteristics of ALD tungsten nitride using B2H6, WF6, and NH3 and application to contact barrier layer for DRAM File

Kim, Soo-Hyun , Kim, Jun-Ki , Lee, Ju Hee , Kwak, Nohjung , Kim, Jinwoong , Jung, Sung-Hoon , Hong, Mi-Ran , Lee, Sang Hyeob , Collins, Josh , Sohn, Hyunchul

Article Issue Date2007-06 View11

Cu direct electrodeposition using step current for superfilling on Ru-Al2O3 layer File

Kim, Myung Jun , Choe, Seunghoe , Kim, Hoe Chul , Lee, Seung-Joon , Kim, Soo-Hyun , Kwon, Oh Joong , Kim, Jae Jeong

Article Issue Date2014-11 View2

Direct Electrodeposition of Cu on Ru-Al2O3 Layer File

Kim, Myung Jun , Kim, Hoe Chul , Kim, Soo-Hyun , Yeo, Seungmin , Kwon, Oh Joong , Kim, Jae Jeong

Article Issue Date2013-01 View6

Effect of ion bombardment during chemical vapor deposition of TiN films File

Park, Ki‐Chul , Kim, Soo‐Hyun , Kim, Ki‐Bum

Article Issue Date2000-07 View4

Influence of additives upon Cu thin film growth on atomic-layer-deposited Ru layer and trench-filling by direct electrodeposition File

Im, Byoungyong , Kim, Sunjung , Kim, Soo-Hyun

Article Issue Date2017-08 View7

Interfacial Adhesion Energy of Ru-AlO Thin Film Deposited by Atomic Layer Deposition between Cu and SiO2: Effect of the Composition of Ru-AlO Thin Film File

Kim, Jeong-Kyu , Cheon, Tae-Hoon , Kim, Soo-Hyun , Park, Young-Bae

Article Issue Date2012-05 View4

Oxidation behavior of graphene-coated copper at intrinsic graphene defects of different origins File File

Kwak, Jinsung , Jo, Yongsu , Park, Soon-Dong , Kim, Na Yeon , Kim, Se-Yang , Shin, Hyung-Joon , Lee, Zonghoon , Kim, Sung Youb , Kwon, Soon-Yong

Article Issue Date2017-11 View5

Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma File

Sari, Windu , Eom, Tae-Kwang , Kim, Soo-Hyun , Kim, Hoon

Article Issue Date2010-11 View11

Plasma-Enhanced Atomic Layer Deposition of TaCx Films Using Tris(neopentyl) Tantalum Dichloride and H-2 Plasma File

Kim, Tae-Ho , Eom, Tae-Kwang , Kim, Soo-Hyun , Kang, Dae-Hwan , Kim, Hoon , Yu, Sangho , Lim, Jin Mook

Article Issue Date2011-05 View4

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